Progress of Research on Lodging Resistance in Wheat (Triticum aestivum L.)
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    Abstract:

    Lodging is one of the major factors affecting grain yield and quality in wheat production. The paper highlighted progresses made on relationships between culm morphological and anatomical characters, chemical components with lodging resistance, genetic analysis and molecular markers for lodging resistance. Plant height and length of basal internodes were negatively correlated with lodging resistance, while culm diameter, wall thickness and dry weight per cm of basal internodes were positively associated with lodging resistance. Culm anatomical characters involving thickness and the cell layer of sclerenchyma (mechanical tissues), the number of vascular bundlers and the area of single vascular bundler, and pith diameter were closely associated with lodging resistance. Culm chemical components including cellulose and lignin content, the amount of carbohydrate stored in culm, and quantity of silicon and potassium were positively related with lodging resistance. Lodging resistance was a quantitative trait, and it was governed by several major genes and possibly minor modifying ones. QTLs associated with lodging resistance and related culm morphological and physiological traits were identified.

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History
  • Received:April 10,2012
  • Revised:November 07,2012
  • Adopted:January 18,2013
  • Online: January 29,2013
  • Published:
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